CF4 Simulations (M. Meyyappapan, etc.)

C2F6 Plasma Paper (D. Graves, etc)

Ion Bombardment Heating on Wafer   using CFD-PLASMA  (Han Ming Wu, Novellus)  GIF Version

Prof. Mark Kushner's Site http://uigelz.ece.uiuc.edu

Dr. Art Phelps (University of Colorado)

Dr. Skip Morgan (Kinema Research)

NIST Electronicd and Electrical Engineering

NIST (Y.-K Kim)

Plasma Damage Tutorial (Giapis, Caltech)

PLASMA ETCH USERS GROUP (NCC AVS)

REACTION MECHANISMS

1) O2/Ar - from E. Meeks, R. S. Larson, P. Ho, C. Apblett, S. M. Han, E.

Edelberg, nad E. S. Aydil, "Modeling of SiO2 deposition in high density

plasma reactors and comparisons of model predictions with experimental

measurements." JVST A 16(2) 1998, p. 544-563.

2) NF3/O2 - from E. Meeks, R. S. Larson, S. R. Vosen, and J. W. Shon,

"Modeling Chemical Downstream Etch Systems for NF3/O2 Mixtures," J.

Electrochem. Soc., 144(1), 1997, pp. 357-366.

3) SIH4/O2/AR with Oxide deposition - from E. Meeks, R. S. Larson, P. Ho, C.

Apblett, S. M. Han, E. Edelberg, nad E. S. Aydil, "Modeling of SiO2

deposition in high density plasma reactors and comparisons of model

predictions with experimental measurements." JVST A 16(2) 1998, p. 544-563.

4) C2F6/O2 with PSG etch - from E. Meeks and P. Ho, “Plasma Modeling ,” in

Advanced Plasma Processing Techniques, R. J. Shul and S. Pearton, Eds.,

Springer-Verlag, New York, in press.

5) BCL3/CL2/AR from E. Meeks, P. Ho, A. Ting, and R. J. Buss, "Simulaitons

of BCl3/Cl2/Ar plasmas with comparisons to diagnostic data," JVST A 16(4)

1998, pp.2227-2239.

Note: the C2F6/O2 includes the CF4 as a subset

Input files may be available upon request from Dr. Ellen Meeks (Reaction Design, [email protected] )

List of  Species [from http://uigelz.ece.uiuc.edu ], Lennard-Jones Potentials, Electron Impact Reactions
and energy tresholds

5. Permitted Species-List

***************************************************************************

SPECIES MOLECULAR NUMBER CHARGE LENNARD-JONES

WEIGHT (AMU) E-IMPACT STATE EPS (K) SIGMA (A)   COLLISIONS

AL  27.0 12 0 2750.000 2.655

AL* 27.0 5 0 2750.000 2.655

AL** 27.0 3 0 2750.000 2.655

AL^ 27.0 2 1 - -

AR 40.0 4 0 93.300 3.542

AR* 40.0 3 0 93.300 3.542