1) Start CFD-GUI and read the grid
Select Model --> Grid --> Import Grid --> DTF and read T5.DTF
Answer "Yes" when asked if the 2D model is axisymmetric
2) Select the Problem Type Options
Select Model --> Problem Type --> Options
Activate Incompressible Flow, Heat Transfer, Reaction,
Electrostatics (FVM Solver), Plasma, Electromagnetics
3) Read Additional Species Database
Select Model --> Prop. --> Species --> Read Additional Species
read ions.SPECIES file
4) Setup the Initial Mixture
Select Model --> Prop. --> Mixture Defn.
Add one mixtures:
Initial: (AR 0.9999, AR+ 0.0001)
5) Define the Gas Properties
Select Model --> Prop. --> Gas
Density = Ideal Gas Law (Ref. Pressure = 1.33 Pa)
Use default values for all other gas properties
6) Define the Solid Properties
Select Model --> Prop. --> Solid
Copper:
Conductivity = 386 W/m-K
Specific Heat = 385 J/kg-K
Density = 8900 kg/m3
Electrostatics/Relative Permittivity =0
Air:
Conductivity = 0.0242 W/m-K
Specific Heat = 1000 J/kg-K
Density = 1.15 kg/m3
Electrostatics/Relative Permittivity =0
Use default values for all other solid properties
7) Define the Gas Phase / Electron Induced Reaction
Select Model --> Models --> Reaction
Set Number of Steps to 1, Rate Constants by: General Rate
Step Number 1: AR --> AR+ (Electron Induced Reaction, Energy Loss:0)
Forward Rate: Ap=1.2e-13 m^3/s, Ea/R=18.7 eV, n=0
Backwards Rate: General Rate, Ap=0 Ea/R=0, n=0
8) Define the Surface Reaction
Select Model -> Models --> Sur. Reaction
Surface Reactions: ON
Surface Mass Transfer: Sticking Coefficient Method
Add a Mechanism (name it "SurfReact") with 1 steps
Step Number 1: AR+ --> AR
Ap=1, Ea/R=0, n=0, Transferred Species=None
9) Turn on Sheath Model
Select Model --> Models --> Sheath Model
Select Bias. Specify:
Bias Frequency:1e6 Hz
DC Bias : 100 V
RF Bias : 20 V
10) Specify the Wafer Position
Select Model --> Bound. Cond. --> Surface BC --> Location
Pick the longer wall on the y-axis and change its name from "Default" to
"Wafer"
11) Change the Interface Boundary Conditions to Material Interfaces
Select Model --> Bound. Cond. --> Surface BC --> Location
Pick the two Interface BC's in Domain 1 and change them to Mat Intf BCs
Pick the two Interface BC's in Domain 4 and change them to Mat Intf BCs
12) Setup the Boundary Condition Values
Select Model --> Bound. Cond. --> Surface BC --> Values
(need pic)
Pick the Cyan colored outer case walls (2)
Potential (Voltage =0)
Isothermal (U=0, V=0, T=323)
Electron Temperature: Fixed Gradient dTe/dn=0
Vector Magnetic Potential: Fixed Potential A(Real)=0, A(Imag)=0
Reaction: Off
Middle-Mouse to complete the set
Pick the Cyan colored chamber walls (3)
Potential (Voltage =0)
Isothermal (U=0, V=0, T=323)
Electron Temperature: Fixed Gradient dTe/dn=0
Vector Magnetic Potential: Fixed Potential A(Real)=0, A(Imag)=0
Reaction: SurfReact
Middle-Mouse to complete the set
Pick the Beige colored Material Interfaces (2)
Potential (Voltage =0)
Set the Reaction to SurfReact
Middle-Mouse to complete the set
13) Setup the Coil Heat Sources
Select Model --> Bound. Cond. --> Heat Sources
Pick the inner coil (closest to x-axis)
Source Type: Total 0.01 W
Middle mouse to accept
Pick the outer coil (farthest from x-axis)
Source Type: Total 0.1 W
Middle mouse to accept
14) Setup the Coil Current
Select Model --> Bound. Cond. --> Coil Current
Pick each of the two coils
Source Type: AC Source, Input: Coil Current
Field Frequency 1.35e7 Hz, Coil Current 35 A
Change Input to Total Power = 150 W
15) Setup the Initial Conditions
Select Model --> Initial Cond. --> Initial Cond
Set Constant Values
Mixture=Initial, U=0, V=0, P(rel)=0, T=323 K, Electron Temp = 3.0 eV
Mag. Potential (Real)=1e-7, Mag. Potential (Imag)=1e-7
16) Set the number of Solution Iterations
Select Solve --> Control --> Iterations --> Solution 500
17) Define the Solution Relaxation Parameters
Select Solve --> Control --> Relaxation
Change the following:
Enthalpy: 0.001
Species Fractions:0.1
Potential: 0.2
Plasma: 0.01
Electromagnetics: 0.01
Temperature: 0.06
18) Change Control --> Electrostatics --> Maximum Iteration Number =2
19) Request Desired Output
Select Solve --> Output --> Graphics (add any desired scalars)
20) Save the DTF file and run the simulation
Select Solution --> Submit
The solution should show the following:
max electron temperature of 2.73 eV
max electron number density of 6.86e16 1/m3
max Temperature of 724 K
max AR+ number density of 6.86e+16 1/m3
max RF electric Field |E|rf of 1460 V/m
In the *out file:
Electron Energy Loss [Watt]
1 DEFAULT_PROPERTIES 0.1497E+03
Power Absorbed by Electrons [Watt]
1 DEFAULT_PROPERTIES 0.1499E+03
----------------------------------------
----------------------------------------
Power Absorbed in Different Domains [Watt]
1 DEFAULT_PROPERTIES 0.1499E+03
3 Coil 0.0000E+00
5 Coil 0.0000E+00
7 Case 0.0000E+00
----------------------------------------
Source Current [A]
1 0.3544E+02
2 0.3544E+02
3 0.0000E+00
18) The ion energy distribution function (IEDF) at all cells across the
wafer is stored in the ACSII file iedf.dat in the form:
ibc isp= 23 2
energy iedf
where ibc is the cell number, isp is species number, energy is
the ion kinetic energy (in eV) and iedf is a normalized ion energy
distrubution function